| 发明名称 |
Resist materials and processes of their use |
| 摘要 |
Resist materials sensitive to actinic radiation are formed from an acid generator and a material sensitive to acid. The acid from the acid generator interacts with the acid sensitive material to produce a change in solubility. Particularly useful acid generators included benzyl and naphthylmethyl sulfones.
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| 申请公布号 |
US5374504(A) |
申请公布日期 |
1994.12.20 |
| 申请号 |
US19930060468 |
申请日期 |
1993.05.11 |
| 申请人 |
AT&T CORP. |
发明人 |
HANSON, JAMES E.;NOVEMBRE, ANTHONY E. |
| 分类号 |
G03F7/004;G03F7/20;H01L21/027;H01L21/30;H01L21/312;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 地址 |
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