发明名称 Method for manufacturing an oxide superconductor thin film
摘要 A method for manufacturing an oxide superconductor thin film is disclosed, which comprises the steps of: (1) preparing a substrate; depositing an oxide superconductor thin film on said substrate by directing a beam containing constituent elements of an oxide superconductor to said substrate; and supplying excited oxygen to or near a thin film deposition site on said substrate during the deposition of said thin film, wherein said beam is selected from the group consisting of an ion beam, neutral particle beam, molecular beam, cluster beam and cluster ion beam, and wherein said excited oxygen is produced by means of generating discharge in an oxygen gas or oxygen-containing gas or by irradiating an oxygen gas or oxygen-containing gas with a beam.
申请公布号 US5374613(A) 申请公布日期 1994.12.20
申请号 US19930140398 申请日期 1993.10.25
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 NODA, ETSUO;SUZUKI, SETSUO;MORIMIYA, OSAMI;HAYASHI, KAZUO
分类号 C23C14/00;C23C14/08;C23C16/40;H01L39/24;(IPC1-7):B05D3/06;B05D5/12 主分类号 C23C14/00
代理机构 代理人
主权项
地址