| 摘要 |
There is hereby provided a photosensitive resin composition suitable for a relief printing plate having an excellent resistance to a water based ink, whereby water or a water like solvent can be employed as a developing solution, which comprises; (i) a polymer (A) having a molecular weight of 5,000 to 500,000 which contains an amino group and a polymerizable double bond moiety, e.g. a butadiene/ethyl arcrylate/acrylonitrile/dimethylaminoethyl acrylate copolymer, (ii) a monomer (B) having an alpha , beta -ethylenically unsaturated bond and a free acid group which can quaternize the nitrogen atom of the polymer (A), e.g. the half-ester of phthalic acid with 2-hydroxyethyl acrylate, or 2-hydroxyethyl acryloyl phosphate, or 2-acrylamide-2-methylpropane sulphonic acid, (iii) a photopolymerizable unsaturated compound (C), and (iv) a photopolymerization initiator (D). r |
