发明名称 Method and device for producing patterns on substrates
摘要 In the case of a method and a device for producing patterns on substrates (50) with zonal coating of the substrate (50) with a medium that prevents subsequent coating, as well as by subsequent application of at least one functional layer, a pattern support (58) in accordance with the pattern to be produced is provided with an indentation pattern, in which the spatial distribution of the bowl-like indentations corresponds to those surface regions of the substrate (50) that are not to be coated, the indentations (42, 42', ...) being filled with the vapour of the medium that prevents coating and the substrate (50) being moved past the pattern support (58), the indentations (42, 42', ...) being aligned with their open sides towards the substrate surface, as a result of which the vapour contained in the indentations is caused to condense on the substrate (50), the substrate (50) being finally provided with at least one functional layer after condensation of at least a part of this vapour. <IMAGE>
申请公布号 DE4311581(A1) 申请公布日期 1994.12.08
申请号 DE19934311581 申请日期 1993.04.08
申请人 LEYBOLD AG, 63450 HANAU, DE 发明人 KLEYER, SIEGFRIED, 6452 HAINBURG, DE
分类号 C23C14/04;C23C14/56;(IPC1-7):C23C14/04;C23C14/20;H01G13/06 主分类号 C23C14/04
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