发明名称 |
Process for manufacturing metallized ceramic substrates. |
摘要 |
<p>Metal is selectively etched from a substrate by: (i) applying an acrylic negative photoresist to the substrate, (ii) imaging and developing the photoresist, (iii) exposing the photoresist to actinic radiation of wavelength 200-310 nm or 2.4-8 microns, and (iv) contacting the photoresist-coated substrate with an etchant so as to remove portions of the metal not covered with photoresist.</p> |
申请公布号 |
EP0627872(A2) |
申请公布日期 |
1994.12.07 |
申请号 |
EP19940106324 |
申请日期 |
1994.04.22 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CYWAR, DOUGLAS;HESS,DON HERMAN;LALONDE, CHRISTIAN |
分类号 |
H01L23/12;C23F1/00;C23F1/38;H01L21/48;H05K3/00;H05K3/06;H05K3/38;(IPC1-7):H05K3/06;G03F7/20 |
主分类号 |
H01L23/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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