发明名称 Gate circuit, semiconductor integrated circuit device and method of fabrication thereof, semiconductor memory and microprocessor
摘要 A novel gate circuit is disclosed. A first semiconductor switch includes a couple of main terminals connected between a first potential level and an output node, in which a high impedance state is held in response to an input signal having a first logic level and a second logic level, and the impedance state changes from high to low only during a transient period when the input signal changes substantially from the first to second logic level. A second semiconductor switch includes a couple of main terminals inserted between a second potential level different from the first potential level and the output node, in which a high impedance state is held in response to the input signal, and the impedance state changes from high to low only during a transient period when the input signal changes from the second to first logic level.
申请公布号 US5371023(A) 申请公布日期 1994.12.06
申请号 US19920895815 申请日期 1992.06.09
申请人 HITACHI, LTD. 发明人 MINAMI, MASATAKA;HIRAKI, MITSURU;YANO, KAZUO;WATANABE, ATSUO;SEKI, KOUICHI;NAGANO, TAKAHIRO;SATO, KAZUSHIGE;YOSHIZUMI, KEIICHI;IZAWA, RYUICHI
分类号 H01L27/06;H01L27/105;(IPC1-7):H01L21/20 主分类号 H01L27/06
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