| 摘要 |
PURPOSE:To improve the yield of the manufacture of a semiconductor light- emitting element array by a method wherein the form of an electrode is made uniform by flattening an electrode installation surface to eliminate variation in the electrical resistance of the electrode, the light output is uniformed and at the same time, defects, such as disconnection of the electrode are reduced. CONSTITUTION:A buffer layer 3 and a reflective layer 4 are formed on a substrate 2, a clad layer 5, a light-emitting layer 6, a clad layer 7 and a contact layer 8 are formed in order on the layer 4, isolation grooves 9 are formed by etching to isolate a light-emitting element 10 and polyimide resin 11 is put in the grooves 9. An electrode 14 is led out passing through the upper surface of the semiconductor crystal layer and the upper surface of an SiN antireflection film 12 formed almost flatly on the whole upper surfaces of the resin 11. |
