MANUFACTURE OF SEMICONDUCTOR SUBSTRATE,申请号JP19930129605-传众专利搜索

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发明名称	MANUFACTURE OF SEMICONDUCTOR SUBSTRATE
摘要
申请公布号	JPH06338604(A)	申请公布日期	1994.12.06
申请号	JP19930129605	申请日期	1993.05.31
申请人	TOSHIBA CORP	发明人	FURUKAWA KAZUYOSHI;FUKUDA KIYOSHI
分类号	H01L21/02;H01L27/12;(IPC1-7):H01L27/12	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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