| 发明名称 |
Laser exposure of photosensitive polyimide for pattern formation |
| 摘要 |
A method of patterning a preimidized benzophenone photoactive polymer used as a photoresist with a laser light source improves its crosslinking efficiency and reduces swelling, thereby enabling the formation of lines on the order of microns.
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| 申请公布号 |
US5370974(A) |
申请公布日期 |
1994.12.06 |
| 申请号 |
US19920905059 |
申请日期 |
1992.06.26 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
AGOSTINO, PETER A.;GIRI, AJAY P.;LANKARD, SR., JOHN R.;MCDONALD, RON J. |
| 分类号 |
G03F7/40;G03F7/038;G03F7/20;G03F7/26;H01L21/027;H01L21/30 |
主分类号 |
G03F7/40 |
| 代理机构 |
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代理人 |
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| 地址 |
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