发明名称 Chip interconnection having a breathable etch stop layer
摘要 An integrated circuit having organic dielectric between interconnection layers eliminates damage caused by vapors outgassing from the organic dielectric by the use of a two-component organic layer having a breathable etch resistant organic layer above the main organic dielectric layer, both of the organic layers remaining in the final circuit. The etch resistant layer is resistant to the etchant used to pattern the layer of interconnect above the organic dielectric.
申请公布号 US5371047(A) 申请公布日期 1994.12.06
申请号 US19920968789 申请日期 1992.10.30
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 GRECO, STEPHEN E.;SRIKRISHNAN, KRIS V.
分类号 H01L21/768;H01L23/12;H01L23/29;H01L23/522;H01L23/532;(IPC1-7):H01L21/90 主分类号 H01L21/768
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