发明名称 PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION
摘要 PURPOSE:To obtain the polyimide film easy in manufacture and enhanced in performance by curing after development by incorporating each of a specified polymer, a compound, a photoinitiator, a sensitizer, and a photoreactive monomer. CONSTITUTION:This composition contains the polymer composed essentially of structural units represented by formula I, the compound represented by formula II, the photoinitiator, the sensitizer, and the photoreactive monomer. In formulae I and II, R<1> is a tri- or tetra-valent organic group having at least 2C; R<2> is a divalent organic group having at least 2C; R<3> is an H; alkali metal ion, or ammonium ion, or a 1-30C organic group; n is 1 or 2; each of Y<1> and Y<2> is -O- or -NH-; R<4> is H or 1-10C lower alkyl; R<5> is an optionally substituted hydrocarbon group; and R<6> is an optionally substituted 1-10C hydrocarbon group, thus permitting the obtained composition to be easy in manufacture and enhanced in performance both as a negative type or a positive type.
申请公布号 JPH06332178(A) 申请公布日期 1994.12.02
申请号 JP19930117261 申请日期 1993.05.19
申请人 TORAY IND INC 发明人 EGUCHI MASUICHI;TAMURA KAZUTAKA;ASANO MASAYA
分类号 C08K5/16;C08L79/08;G03F7/004;G03F7/027;G03F7/037;G03F7/038;G03F7/039;H01L21/027;(IPC1-7):G03F7/038 主分类号 C08K5/16
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