| 摘要 |
PURPOSE:To eliminate an increase in pattern exposing time and to improve the accuracy of pattern edge parts by setting the film thickness of a photoresist as far as possible in the case of formation of black matrix patterns by a photofabrication system. CONSTITUTION:This color filter has the black matrix patterns 2, filter color patterns composed of respective colored patterns Blue, Green and Red and a transparent conductive layer, etc. The black matrix patterns 2 are composed of a first pattern layer 3 consisting of a light shieldable anionic or cationic nonphotosensitive polymer and a second pattern layer 4 of a light shieldable photosensitive resin contg. a cationic or anionic polymer, resin monomer and photopolymn. initiator matched and laminated on the first pattern layer. |
