发明名称 SEMICONDUCTOR MANUFACTURING DEVICE
摘要 <p>PURPOSE:To perform a stable exposure processing and enhance the producibility in an aligner stepper for performing a photograph etching onto a semiconductor wafer in a semiconductor step. CONSTITUTION:For example, a vacuum hole 12 is formed centering a stage holder 11 and vacuum grooves 13a to 13e are concentrically provided on a surface of the holder 11 centering the vacuum hole 12. The vacuum grooves 13a to 13e are connected with the vacuum hole 12 via a communicating vacuum groove 14. Also, a pin hole 16 is provided between the vacuum grooves 13a and 13b so as to hold clearance against a center up/down pin 15. The space between this pin hole 16 and the pin 15 is sealed with a sealing ring, whereby the leak amount of the open air from the pin hole 16 is reduced and the reduction in an adsorption force is prevented.</p>
申请公布号 JPH06333799(A) 申请公布日期 1994.12.02
申请号 JP19930119682 申请日期 1993.05.21
申请人 TOSHIBA CORP 发明人 TAJI SATOSHI;TAKAHARA MASAKI;NAKAMURA HIDEAKI;AOYAMA MASAAKI
分类号 B23Q3/08;H01L21/027;H01L21/68;H01L21/683;(IPC1-7):H01L21/027 主分类号 B23Q3/08
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