| 摘要 |
PURPOSE:To provide an exposure device which has high resolution while reducing lowering of through-put by changing at lease one of a numerical aperture of an illumination system and a numerical aperture of a projection lens during exposure and by controlling a resist cross section profile properly. CONSTITUTION:A light emitting part of a light source 1 is arranged in an area near a first focus of an elliptic mirror 2 and a secondary light source is formed in a projection surface by a fly's eye lens 3. An aperture diameter of a diaphragm 5 of an illumination system and an aperture diameter of a pupil diaphragm 9 of a projection system are made changeable. When illumination is started on a surface of a reticle 7, a part of an amount of exposure cast on a surface of the reticle 7 passes through a half mirror surface 6a and integrating counting is performed by a photosensor 24, a current voltage converter 25, a VF converter 26 and an integrating counter 27. An integrating calculation value is input to memories 28, 32 and output to DA converters 29, 33. A servo amplifier 30 drives a DC motor 20 by using a diaphragm driver 31 of an illumination system and a servo amplifier 34 drives a DC motor 22 by using a pupil driver 35 of a projection lens 8. |
