| 摘要 |
PURPOSE:To allow enhancement of accuracy in the supply quantity of rare gas and halogen gas for excimer laser. CONSTITUTION:A subchamber 21 of predetermined concentration having small volume is provided for gas having low concentration ratio, e.g. rare gas or halogen. The conditioning method comprises a step for conditioning a mixture gas in the subchamber 21 having volume smaller than that of a laser chamber 2, a step for evacuating the laser chamber 2 and then supplying the mixture gas from the subchamber 21 into the laser chamber 2, and a step for supplying buffer gas into the laser chamber 2 not through the subchamber 21. |
