| 摘要 |
<p>PURPOSE:To provide a retainer for a semiconductor wafer, in which the flow of a wafer-treating liquid is satisfactory and the rotation of the wafer can be performed smoothly and the shortening of treating time and improvement of treatment effect are possible. CONSTITUTION:In a retainer for retaining a semiconductor wafer 3 at the time of performing various processes of the wafer, contact parts coming into contact with the outer peripheral edge of the wafer 3 are formed of almost circular protrusion 2b.</p> |
