| 摘要 |
PURPOSE:To reduce the scattering of developer to a periphery due to centrifugal force by providing a spinning stand having a recessed part which is larger than a substrate and deeper than the thickness of the substrate to hold a substrate in it. CONSTITUTION:A development stand 8 is formed to a disc and a recessed part 9 is formed in an upper surface thereof. The recessed part 9 is made larger than a substrate W in a plane view and deeper than the thickness of the substrate W. When development is carried out, developer is first supplied to the surface of the substrate W from a developer nozzle 10 immediately above the substrate W mounted on the development stand 8, developer is spreaded uniformly in a surface of the substrate W by rotating the development stand 8, the rotation is stopped for a specified time and an image is formed by fusing a fusible part of a resin film by the developer and an image is formed. According to this constitution, when developer is spreaded throughout an entire of a substrate surface by rotating a development stand, it is possible to reduce the scattering of developer to a periphery due to centrifugal force and to cut a use amount of developer. |
