| 摘要 |
PURPOSE:To eliminate an increase in pattern exposing time and to improve the accuracy of the pattern edge parts of black matrix patterns without using a black pigment dispersed photoresist by forming the black matrix patterns by a vapor deposition method, photofabrication (photolithographic method) method and electroless plating method. CONSTITUTION:This color filter has the black matrix patterns 2, filter color patterns composed of respective colored patterns Blue, Green and Red and a transparent conductive layer, etc. The black matrix patterns 2 are composed of a first pattern layer 3 consisting of a vapor deposited light shieldable chromium oxide layer and a second pattern layer 4 of a light shieldable nickel plating layer matched and laminated on the first pattern layer 3. |
