Procedure for obtaining fine layers of oxides by ion bombardment and the use of volatile metal precursors

摘要

Procedure for obtaining fine layers of oxides by ion bombardment and the use of volatile metal precursors. Procedure for obtaining fine layers of oxides by bombardment with ionic species of oxygen and the use of volatile precursors, consisting in causing the simultaneous arrival on the desired substrate of a flow of vapour of the metal whose oxide it is desired to obtain and a beam of oxygen species which have been ionized and accelerated until they attain the desired kinetic energy. Layers of controlled thickness of any type of oxide can be obtained by this procedure. <IMAGE>