发明名称 |
Top gate TFT with polymer interface control layer |
摘要 |
A transistor includes a substrate and a polymer layer that is in contact with the substrate. The polymer layer has a first pattern defining a first area. There is an inorganic semiconductor layer over and in contact with the polymer layer that has a second pattern defining a second area. The first area is located within the second area. There is a source electrode in contact with a first portion of the semiconductor layer and a drain electrode in contact with a second portion of the semiconductor layer, and the source electrode and the drain electrode separated by a gap. A gate insulating layer is in contact with the inorganic semiconductor layer in the gap. There is a gate in contact with the gate insulating layer over the gap. |
申请公布号 |
US9391210(B2) |
申请公布日期 |
2016.07.12 |
申请号 |
US201414487184 |
申请日期 |
2014.09.16 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
Ellinger Carolyn Rae;Nelson Shelby Forrester |
分类号 |
H01L29/10;H01L29/786;H01L29/417 |
主分类号 |
H01L29/10 |
代理机构 |
|
代理人 |
Zimmerli William R. |
主权项 |
1. A transistor comprising:
a substrate; an electrically insulating polymer layer in contact with the substrate, the electrically insulating polymer layer having a first pattern defining a first area; an inorganic semiconductor layer over and in contact with the electrically insulating polymer layer and having a second pattern defining a second area, the first area located within the second area; a source electrode in contact with a first portion of the semiconductor layer; a drain electrode in contact with a second portion of the semiconductor layer, the source electrode and the drain electrode separated by a gap; a gate insulating layer in contact with the inorganic semiconductor layer in the gap; and a gate in contact with the gate insulating layer over the gap. |
地址 |
Rochester NY US |