POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR PRODUCTION OF MICROLENS PATTERN

摘要

The present invention relates to a positive-type photosensitive resin composition for use in the formation of microlens patterns, having desirable resolution and wide flow margin, a method for fabricating a microlens pattern using the same, and a method for producing a microlens. The positive-type photosensitive resin composition for use in the formation of microlens patterns, comprises: a resin (A) which has an acid dissociable dissolution inhibiting group and whose solubility in a base increases through the action of acid; a compound (B) having at least 2 vinyloxy groups; and a photo acid generator (C), wherein the resin (A) includes a resin (A1) that includes a repeating unit (a1) which is derived from hydroxystyrene and a repeating unit (a2) derived from hydroxystyrene having a hydrogen atom in at least one hydroxyl group is substituted with an acid dissociable dissolution inhibiting group.