摘要 |
According to the present invention, there is provided the following positive resist composition which is excellent in properties such as resolution, profile, depth of focus, etc. and free from scum: a positive resist composition comprising (a) a novolac resin obtained through a condensation reaction of an aldehyde compound and a mixture of phenol compounds comprising m-cresol, p-cresol and 2,5-xylenol, (b) a light-sensitive quinonediazide material containing the quinonediazidesulfonic acid diester of the compound having not less than three phenolic hydroxyl groups in an amount of 40% or more as expressed in terms of pattern area measured by high performance liquid chromatography, and (c) an alkali-soluble compound having a molecular weight of lower than 900. |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
OSAKI, HARUYOSHI;EBINA, CHINEHITO;MORIUMA, HIROSHI;UETANI, YASUNORI |