发明名称 PHOTOMASK AND EXPOSING METHOD
摘要 PURPOSE:To hardly perceive contrast difference caused on a connecting part in the case of performing exposure by picture synthesis. CONSTITUTION:The connecting parts 43 obtained in the case of performing exposure by the picture synthesis are exposed to be overlapped to each other's, and unit patterns arrayed on the connecting part 43 are discretely, irregularly, and selectively exposed so that the unit patterns may not be repeatedly exposed twice or more. Thus, even through the contrast difference exists between the unit patterns formed on the connecting part, the unit patterns having the contrast difference are mixed, so that the connecting part is hardly perceived.
申请公布号 JPH06324474(A) 申请公布日期 1994.11.25
申请号 JP19930132585 申请日期 1993.05.10
申请人 NIKON CORP 发明人 NARAKI TAKESHI
分类号 G02F1/136;G02F1/1368;G03F1/70;H01L21/027;H01L21/30 主分类号 G02F1/136
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