发明名称 METHOD AND DEVICE FOR PLASMA SPRAYING
摘要 PURPOSE:To prevent attachment of spraying particles to the part of a base material not necessary to form a coating film through throttling of a plasma jet and to secure the attaching amount of the film without causing prolongation of the spraying time. CONSTITUTION:With the plasma spraying method according to the present invention, a coating film 10 is formed by generating arcs between a cathode 2 and an anode nozzle 1 and spouting a plasma jet consisting of spraying particles 3 and working gas 4 to the surface of a base material 7. An electromagnetic coil 11 is installed around the plasma jet, and a current is fed to this coil so that a magnetic field is generated.
申请公布号 JPH06325895(A) 申请公布日期 1994.11.25
申请号 JP19940045306 申请日期 1994.03.16
申请人 AISIN SEIKI CO LTD 发明人 KUSANO TOSHIKUNI;ITOU ATSUNAO
分类号 C23C4/12;H05H1/40 主分类号 C23C4/12
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