SOLAR-INDUCED CHEMICAL VAPOR DEPOSITION OF DIAMOND-TYPE CARBON FILMS

摘要

A chemical vapor deposition method for depositing transparent continuous coatings of sp<3>-bonded diamond carbon films, comprising: a) providing a volatile hydrocarbon gas/H2 reactant mixture in a cold wall vacuum chemical vapor deposition chamber (13) containing a substrate (14) for said films, at pressure of about 1 to 50 Torr; and b) directing a concentrated solar flux (15) of from about 40 to about 60 watts/cm<2> through said reactant mixture to produce substrate temperatures of about 750 DEG C to about 950 DEG C to activate deposition of the film on said substrate (14).