TOXICITY-REMOVING AGENT FOR ETCHING EXHAUST GAS AND METHOD FOR USING THE SAME

摘要

PURPOSE:To obtain a toxicity removing agent for etching exhaust gas which can convert a harmful halogen-containing substance contained in etching exhaust gas from semiconductor manufacturing equipment etc., into a harmless, hardly- hydrolyzed compound by using a composition consisting of iron oxide and manganese oxide as a main component. CONSTITUTION:A toxicity removing agent for etching exhaust gas is obtained by using a composition consisting of 20-95 pts.wt. of iron oxide as Fe2O3 and 5-80 pts.wt. of manganese oxide as a main component. As a method for using the toxicity removing agent, the etching exhaust gas is passed through a layer 2 filled with the agent of the above composition and then a layer 3 filled with active carbon carrying metal oxide (e.g. CuO and ZnO). As a result, a halogen- containing substance in the etching exhaust gas is converted into a harmless, hardly-hydrolyzed compound.