发明名称 Aerosol-plasma deposition of films for electronic cells
摘要 An atmospheric process for the production of a coating of film upon a nickel-containing substrate. In the first step of this process, an aerosol mist containing reactants necessary to form the coating is provided. Thereafter, the mist is subjected to radio-frequency radiation while in the plasma region. Thereafter, the vaporized mixture is then deposited onto a nickel substrate. In subsequent steps, one or more other layers of vaporized material may be deposited onto the coated substrate.
申请公布号 US5366770(A) 申请公布日期 1994.11.22
申请号 US19930120581 申请日期 1993.09.13
申请人 WANG, XINGWU 发明人 WANG, XINGWU
分类号 C23C16/40;C23C16/448;C23C16/513;H01L39/24;(IPC1-7):B05D3/06;B05D3/02 主分类号 C23C16/40
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