| 摘要 |
Compounds of the formula (1), <IMAGE> (1) in which R1 is C1-C25alkyl, C7-C9phenylalkyl, unsubstituted or C1-C4alkyl-substituted phenyl, unsubstituted or C1-C4alkyl-substituted C5-C8cycloalkyl; C3-C25alkenyl, C3-C25alkynyl or C3-C25alkyl which is interrupted by oxygen, sulfur or >N-R16, and R16 is hydrogen or C1-C8alkyl, R2, R3, R4 and R5, independently of one another are hydrogen, C1-C25alkyl, C7-C9phenylalkyl, unsubstituted or C1-C4alkyl-substituted phenyl, unsubstituted or C1-C4alkyl-substituted C5-C8cycloalkyl; C1-C18alkoxy, hydroxyl, C1-C25alkanoyloxy, C3-C25alkenoyloxy, C3-C25alkanoyloxy which is interrupted by oxygen, sulfur or >N-R16; C6-C9cycloalkylcarbonyloxy, benzoyloxy or benzoyloxy which is substituted by C1-C12alkyl, and R16 is as defined above, or, furthermore, the radicals R2 and R3 or the radicals R4 and R5 together with the carbon atoms to which they are bound form a benzo ring, R4 is additionally -(CH2)n-COR11, in which n is 0, 1 or 2, R11 is hydroxyl, <IMAGE> C1-C18alkoxy or <IMAGE> R14 and R15, independently of one another are hydrogen or C1-C18alkyl, M is an r-valent metal cation and r is 1, 2 or 3, R7, R8, R9 and R10, independently of one another, are hydrogen, C1-C4alkyl or C1-C4alkoxy, with the proviso that at least one of the radicals R7, R8, R9 R10 is hydrogen, and, in the case where R3, R5, R6, R7 and R10 are hydrogen, R4 is additionally a radical of the formula (2) <IMAGE> (2) in which R1, R2, R8 and R9 are as defined above and R12 and R13, independently of one another, are hydrogen, CF3, C1-C12alkyl or phenyl, or R12 and R13 together with the carbon atom to which they are bound form a C5-C8cycloalkylidene ring which is unsubstituted or substituted by 1 to 3 C1-C4alkyl; R6 is hydrogen or a radical of the formula (3) <IMAGE> R7OR1+RE (3) in which R1, R2, R3, R4, R5, R7, R8, R9 and R10 are as defined above, are described as stabilizers for organic materials against thermal, oxidative or light-induced degradation.
|
