发明名称 |
Negative ion beam injection apparatus with magnetic shield and electron removal means |
摘要 |
A negative ion source is constructed to produce H- ions without using Cesium. A high percentage of secondary electrons that typically accompany the extracted H- are trapped and eliminated from the beam by permanent magnets in the initial stage of acceleration. Penetration of the magnetic field from the permanent magnets into the ion source is minimized. This reduces the destructive effect the magnetic field could have on negative ion production and extraction from the source. A beam expansion section in the extractor results in a strongly converged final beam.
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申请公布号 |
US5365070(A) |
申请公布日期 |
1994.11.15 |
申请号 |
US19920875778 |
申请日期 |
1992.04.29 |
申请人 |
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
发明人 |
ANDERSON, OSCAR A.;CHAN, CHUN F.;LEUNG, KA-NGO |
分类号 |
H01J27/02;(IPC1-7):H01J27/02 |
主分类号 |
H01J27/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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