发明名称 Method of making a semiconductor device with buried electrode
摘要 A semiconductor device including a bipolar transistor, has a collector region including a first semiconductor region of the first conductivity type and a second semiconductor region of the first conductivity type having higher resistance than the first semiconductor region, a base region including a semiconductor region of the second conductivity type, and an emitter region including a semiconductor region of the first conductivity type. The semiconductor device further comprises a metal layer region for connecting the first semiconductor region and the collector electrode on the collector region provided within the second semiconductor region layer of the collector region.
申请公布号 US5364802(A) 申请公布日期 1994.11.15
申请号 US19930130461 申请日期 1993.10.01
申请人 CANON KABUSHIKI KAISHA 发明人 KATAOKA, YUZO;ICHISE, TOSHIHIKO;ISHIZUKA, KEIJI;ASABA, TETSUO
分类号 H01L21/331;H01L21/335;H01L21/74;H01L21/761;H01L29/08;H01L29/417;(IPC1-7):H01L21/331 主分类号 H01L21/331
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