| 摘要 |
A method for producing oriented, intermetallic, thin film structures having uniaxial magnetic, electronic, optical, and mechanical properties. Artificial superlattices (10) are assembled by sputter deposition of alternating layers of the component metals of the target intermetallic compound on an aligned substrate (16). Either single crystal substrates or crystallographically textured substrates may be used to induce alignment of the deposited layers (10, 12) in the method of the present invention. Annealing of the resulting superlattice (10) generates aligned, thin film intermetallic compounds (38) of the component metals at the interfaces (44) of the superlattice (10), the thin film intermetallic compounds having pronounced, uniaxial properties.
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