发明名称 SUBSTRATE WET-TREATMENT APPARATUS
摘要 <p>PURPOSE:To provide a wet-treatment technique wherein a large-sized substrate is treated with low contamination, in a cassette-less manner and by a batch system of high production efficiency. CONSTITUTION:A rectangular or square substrate SB housed in a carrier cassette and carried into from a previous process is taken out from the carrier cassette, and it is conveyed and treated in a cassetteless manner. At this time, the substrate SB is tilted in such a way that two adjacent rectangular sides SBa, SBb become tilted lover sides, the two tilted lower sides are supported and conveyed in a suspended state, the substrate is transferred and held on a substrate holding stand 50 inside a treatment tank, and the substrate is wet- treated. Thereby, the rectangular or square large-sized substrate SB can be treated by a simple constitution, in a cassetteless manner and by a batch system.</p>
申请公布号 JPH06318627(A) 申请公布日期 1994.11.15
申请号 JP19930131231 申请日期 1993.05.06
申请人 SUGAI:KK 发明人 KOYANAGI TETSUO;YAMAGUCHI HIROSHI;OTA AKIRA
分类号 B65G49/04;G03F1/82;H01L21/027;H01L21/30;H01L21/304;H01L21/306;H01L21/677;H01L21/68;(IPC1-7):H01L21/68;G03F1/08 主分类号 B65G49/04
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