发明名称 SYSTEM AND METHOD FOR MANUFACTURE OF MULTIPLE HOLOGRAPHIC ELEMENT
摘要 <p>PURPOSE: To manufacture a highly accurate and efficient multiple holography element. CONSTITUTION: This system is provided with a process for forming a master multiple holography element 28 having an absorbing grating pattern for generating a prescribed refractive index pattern over the element 28 and a process for orientating a recording beam to a photopolymer layer through the element 28. The absorbing grating pattern of the element 28 adjusts the recording beam and the adjusted recording beam generates a monomer in the photopolymer to form a monomer pattern for generating a prescribed refractive index pattern over the photopolymer layer. The system is also provided with a process for fixing the monomer of the photopolymer layer on the monomer pattern to form a copy of the element 28 on the monomer pattern and a process for removing the photopolymer layer from the element 28.</p>
申请公布号 JPH06318029(A) 申请公布日期 1994.11.15
申请号 JP19930250547 申请日期 1993.10.06
申请人 GRUMMAN AEROSPACE CORP 发明人 ROBAATO DABURIYU BURANDOSUTETAA;NAIRUZU JIEI FUONERANDO
分类号 G02B5/32;G03H1/20;G03H1/26;(IPC1-7):G03H1/26 主分类号 G02B5/32
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