发明名称 |
SYSTEM AND METHOD FOR MANUFACTURE OF MULTIPLE HOLOGRAPHIC ELEMENT |
摘要 |
<p>PURPOSE: To manufacture a highly accurate and efficient multiple holography element. CONSTITUTION: This system is provided with a process for forming a master multiple holography element 28 having an absorbing grating pattern for generating a prescribed refractive index pattern over the element 28 and a process for orientating a recording beam to a photopolymer layer through the element 28. The absorbing grating pattern of the element 28 adjusts the recording beam and the adjusted recording beam generates a monomer in the photopolymer to form a monomer pattern for generating a prescribed refractive index pattern over the photopolymer layer. The system is also provided with a process for fixing the monomer of the photopolymer layer on the monomer pattern to form a copy of the element 28 on the monomer pattern and a process for removing the photopolymer layer from the element 28.</p> |
申请公布号 |
JPH06318029(A) |
申请公布日期 |
1994.11.15 |
申请号 |
JP19930250547 |
申请日期 |
1993.10.06 |
申请人 |
GRUMMAN AEROSPACE CORP |
发明人 |
ROBAATO DABURIYU BURANDOSUTETAA;NAIRUZU JIEI FUONERANDO |
分类号 |
G02B5/32;G03H1/20;G03H1/26;(IPC1-7):G03H1/26 |
主分类号 |
G02B5/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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