发明名称 |
System for repeatable temperature measurement using surface reflectivity |
摘要 |
A system is disclosed for externally measuring the temperature of a substrate having a reflective surface within a chamber. The system comprises a first light source having sufficient intensity for bombarding the reflective surface with photons, thereby heating the surface. The first light source has an output level and a wavelength substantially in the absorption band of silicon. The system also comprises means for exposing the substrate to a gas in order to form a layer superjacent the reflective surface. A sensor, preferably a photo detector, for sensing changes in the reflectivity of the surface is included. In one embodiment of the present invention, the sensor comprises a second light source and a sensor, for sensing the reflectivity of the surface caused by the reflecting photons. Furthermore, the system comprises control circuitry for controlling the first light source in response to the sensor; the control circuitry being coupled to the sensor by a feedback loop.
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申请公布号 |
US5364187(A) |
申请公布日期 |
1994.11.15 |
申请号 |
US19930028040 |
申请日期 |
1993.03.08 |
申请人 |
MICRON SEMICONDUCTOR, INC. |
发明人 |
THAKUR, RANDHIR P. S.;SANDHU, GURTEJ S.;MARTIN, ANNETTE L. |
分类号 |
G01K11/00;(IPC1-7):G01K11/00 |
主分类号 |
G01K11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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