发明名称 System for repeatable temperature measurement using surface reflectivity
摘要 A system is disclosed for externally measuring the temperature of a substrate having a reflective surface within a chamber. The system comprises a first light source having sufficient intensity for bombarding the reflective surface with photons, thereby heating the surface. The first light source has an output level and a wavelength substantially in the absorption band of silicon. The system also comprises means for exposing the substrate to a gas in order to form a layer superjacent the reflective surface. A sensor, preferably a photo detector, for sensing changes in the reflectivity of the surface is included. In one embodiment of the present invention, the sensor comprises a second light source and a sensor, for sensing the reflectivity of the surface caused by the reflecting photons. Furthermore, the system comprises control circuitry for controlling the first light source in response to the sensor; the control circuitry being coupled to the sensor by a feedback loop.
申请公布号 US5364187(A) 申请公布日期 1994.11.15
申请号 US19930028040 申请日期 1993.03.08
申请人 MICRON SEMICONDUCTOR, INC. 发明人 THAKUR, RANDHIR P. S.;SANDHU, GURTEJ S.;MARTIN, ANNETTE L.
分类号 G01K11/00;(IPC1-7):G01K11/00 主分类号 G01K11/00
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