发明名称 |
Method of manufacturing X-ray exposure mask |
摘要 |
The present invention relates to a method of manufacturing an exposure mask having an unprecedented supermicrostructure for an X-ray exposure method favorable for conventional supermicro exposure using lithography techniques. The method of manufacturing an X-ray exposure mask comprises the steps of alternately laminating two kinds of compound semiconductors as a thin film having a periodic structure with controllability of about one atomic layer on a substrate selectively etching only one material for forming the periodic structure, forming an uneven difference between adjacent layers of the laminate body, and manufacturing a mask for exposing streaks on a desired resist with the aid of a difference of X-rays absorption amounts between each layer by exposing X-ray in parallel to the direction of the laminate layer.
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申请公布号 |
US5364717(A) |
申请公布日期 |
1994.11.15 |
申请号 |
US19920953669 |
申请日期 |
1992.10.01 |
申请人 |
TOKYO INSTITUTE OF TECHNOLOGY |
发明人 |
FURUYA, KAZUHITO;MIYAMOTO, YASUYUKI |
分类号 |
G03F1/16;G03F1/14;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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