METHOD OF MAKING FIELD EMISSION TIPS USING PHYSICAL VAPOR DEPOSITION OF RANDOM NUCLEI AS ETCH MASK

摘要

A method of making sub-micron low work function field emission tips (32, 66) without using photolithography. The method includes physical vapor deposition of randomly located discrete nuclei to form a discontinuous etch mask (20, 50). In one embodiment an etch is applied to low work function material (14) covered by randomly located nuclei to form emission tips (32) in the low work function material (14). In another embodiment an etch is applied to base material (44) covered by randomly located nuclei to form tips (58) in the base material (44) which are then coated with low work function material (60) to form emission tips (66). Diamond is the preferred low work function material (14, 60).