| 发明名称 |
Ventilation einer Vakuumbehandlungsvorrichtung. |
| 摘要 |
<p>Controlled, low-turbulence venting of a semiconductor processing vacuum chamber is provided by a venting system including sensing elements for sensing gas conditions, including pressure, in the chamber during venting, and vent rate control elements, including a flow rate regulator valve, responsive to the sensing elements for attaining a venting rate approaching a selected maximal venting rate threshold of sonically choked flow, thereby attaining enhanced non-sonically-choked venting.</p> |
| 申请公布号 |
DE68918630(D1) |
申请公布日期 |
1994.11.10 |
| 申请号 |
DE1989618630 |
申请日期 |
1989.06.02 |
| 申请人 |
VARIAN ASSOCIATES, INC., PALO ALTO, CALIF., US |
发明人 |
MILGATE, ROBERT W. III, GLOUCESTER MA 01930, US |
| 分类号 |
B01J3/02;C23C16/52;C30B25/14;H01L21/265;H01L21/302;H01L21/3065;(IPC1-7):H01L21/00 |
主分类号 |
B01J3/02 |
| 代理机构 |
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代理人 |
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