| 摘要 |
PURPOSE:To suppress contamination of an element to be cleaned such as a semiconductor wafer by increasing the degree of freedoms of selecting a material of a filter material and selecting a suitable filtering material. CONSTITUTION:A filter unit is provided at a sidewall of a transfer chamber at a lower side of a vertical heat treating furnace. This unit is formed in a cylindrical filter 5 by forming air supply holes 51 extended axially and closed at lower ends in a cylindrical filter material 51 formed in a cylindrical shape of a metal porous body, provided with an air flow control panel 6 so as to surround parts of peripheries at its back surface side, provided with air flow control plates 61, 62 made of punching metal plates, etc., at a front surface side to convert gas diffused from the filter 5 to a laminar flow. The air is fed to multiple air supply holes 52 under pressure, for example, through a manifold from a pump. |
