| 摘要 |
PURPOSE:To obtain a film for X-ray radiography being excellent in chemical stability and having strength, hardness and pressure resistance improved, by a method wherein an amorphous hard carbon film formed by a plasma CVD method using RF of a low output is used without a substrate. CONSTITUTION:With an organic compound gas, a hydrocarbon gas in particular, used as a material and by using a plasma CVD method with an RF output lowered to 15W/cm<2> or below, film-forming active species are deposited on a glass base under a low pressure and thereby an amorphous carbon film is formed. The amorphous film prevents diffraction of an X ray, and by forming the carbon film on the glass base, exfoliation from the glass base is facilitated. In the case when the plasma CVD method being suitable for mass production is used, a specific resistance and hardness are increased uniformly as the RF output becomes low and as a pressure becomes low. In order to obtain transmittance in the same degree as Be leaf of a thickness 25mum, however, it is necessary for the film to be used in a film thickness of 8mum or below. In this case, thermal conductivity is ten times higher, a melting point two times, a Young's modulus two times and a tensile strength six time higher approximately than the ones of Be of the thickness 25mum.
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