发明名称 Strained quantum well type semiconductor laser device
摘要 A strained quantum well type semiconductor laser device is disclosed to comprise a plurality of layers including a quantum well active layer formed on a semiconductor substrate characterized in that tensile strained quantum well layers and compression strained barrier layers are stacked alternately to form said quantum well active layer and the quantum well layers are made of either InGaAs or InGaAsP and InP, when the semiconductor substrate is made of InP, InGaP or GaAs, respectively.
申请公布号 US5363392(A) 申请公布日期 1994.11.08
申请号 US19920978234 申请日期 1992.11.18
申请人 THE FUROKAWA ELECTRIC CO., LTD. 发明人 KASUKAWA, AKIHIKO;KIKUTA, TOSHIO
分类号 H01S5/00;H01S5/02;H01S5/34;H01S5/343;(IPC1-7):H01S3/19 主分类号 H01S5/00
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