| 摘要 |
PURPOSE:To provide a method for manufacturing an X-ray mask blank in which an X-ray transmission film having excellent flatness can be always stably formed and a method for manufacturing an X-ray mask. CONSTITUTION:When a coated film coated with silicon oxide film forming coating liquid on the surface of an X-ray transmission film 12b by a rotary coating method is baked to form a treated film 14 and surface layers of the film 14 and the film 12b are sequentially uniformly etched to obtain a flattened X-ray transmission film 12d, a baking temperature in the step of baking the coated film in the flattening step is so set to a temperature that an etching velocity of the treated film obtained by the baking is equal to that of the transmitted film or their difference becomes small. |
