发明名称 |
Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds |
摘要 |
Positive photoresist compositions and methods using the photoresist compositions for making submicron patterns in the production of semiconductor devices are disclosed. The photoresists contain sensitizers that are mixed naphthoquinonediazide 4- and 5- sulfonic acid esters of bis and tris(mono, di and trihydroxyphenyl) alkanes.
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申请公布号 |
US5362599(A) |
申请公布日期 |
1994.11.08 |
申请号 |
US19910792115 |
申请日期 |
1991.11.14 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATIONS |
发明人 |
KNORS, CHRISTOPHER J.;MIURA, STEVE S.;MONTGOMERY, MELVIN W.;MOREAU, WAYNE M.;SMITH, RANDOLPH J. |
分类号 |
G03F7/022;H01L21/027;(IPC1-7):G03F7/023;G03F7/30 |
主分类号 |
G03F7/022 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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