| 摘要 |
A photoresist composition which comprises a compound of the general formula: <IMAGE> (I) wherein R1, R2 and R3 are the same or different and represent a hydrogen atom, a hydroxyl group, -OCOR4, -O-R5, -OSi(R6)3, a halogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted phenyl group or an optionally substituted aralkyl group; R4, R5 and R6 represent an optionally substituted lower alkyl group or an optionally substituted phenyl group; X and Y are the same or different and represent -CN, -COOR7, -CONR8R9, <IMAGE> R7 represents an alkyl group; R8 and R9 are the same or different and represent a hydrogen atom, an optionally substituted alkyl or phenyl group; R10 represents a hydrogen atom, an optionally substituted alkyl group or a hydroxyl group; and a is a number of 1 to 2, which is suitable for forming fine patterns having high resolution on a substrate having high reflectance.
|
