| 摘要 |
PURPOSE:To enhance the removability of a molding and the yield of the same by heating the pattern of a photoresist at a temperature exceeding the heat resistance of the photoresist and forming the original plate of a duplicating mold so that the cross section of sidewalls of the pattern becomes gradually narrower toward their edges. CONSTITUTION:After forming the pattern of a photoresist 2 on a silicone base plate 1, the pattern is heated at a temperature exceeding the heat resistance of the photoresist 2, and the sidewalls of the pattern of the photoresist 2 are deformed so as to be inclined in such a manner that their cross section becomes gradually narrower toward their edges. thus forming the original plate of a duplicating mold. A nickel film 6 is then formed on the base plate 1 being the original plate and on the pattern of the photoresist 2 to impart conductive properties to the surfaces of the base plate 1 and the pattern of the photoresist 2. Thereafter, nickel electroforming is performed from the top of the nickel film 6 to form a nickel mold 7 for duplicate by removing the silicone base plate 1 and the pattern of the photoresist 2. By this method, the grooves 8 of the duplicating mold 7 are formed into a draft shape by transferring the sectional shape of the pattern of the photoresist 2, so that the removability of a molding can be enhanced. |
