发明名称 Monolithic circuit fabrication method
摘要 A monolithic circuit, such as a piezoelectric device, semiconductor, or the like, may be fabricated by forming an operational metallization layer (12) on a substrate (10). A subsequent layer (40), such as a sealing ring pattern (42) may then be applied using a thin film deposition technique. A thin film material is applied through a mask assembly (28). The mask assembly (28) includes a mask material (30) that has been applied to a screen (24) and patterned as desired. The mask material (30) extends beyond the screen (24) so that only the mask material contacts the substrate (10) during thin film deposition. Preferably, the screen (24) is woven from individual wires (26) having circular cross-sectional shapes. The subsequent layer (40) is applied both through perforations (18) in the screen (24) and under the screen's wires (26).
申请公布号 US5361967(A) 申请公布日期 1994.11.08
申请号 US19930149900 申请日期 1993.11.10
申请人 MOTOROLA, INC. 发明人 ANDERSON, MICHAEL J.;KNUTH, HOWARD D.;PASCO, WAYNE D.
分类号 C23C14/04;H03H3/08;H03H9/145;H05K3/14;(IPC1-7):H01L21/52 主分类号 C23C14/04
代理机构 代理人
主权项
地址