| 摘要 |
<p>PURPOSE:To surely manufacture a resistor of objective precision at a low cost, without especially highly managing photomask precision and irregularity of side etching amount and necessitating expensive post-treatment. CONSTITUTION:When resistor pattern are formed on a photomask, a resistor pattern 4 wherein the resistor length 1 and the resistor width 2 are standard sizes and resistor patterns 4 wherein the lengths and the widths are little increased or decreased are formed in the same photomask. Since error factors such as side etching exist in the later process, the actual resistor lengths and the widths are different from the values of the resistor patterns 4. The tendency of the difference is identical in one time forming. Hence a resistor pattern wherein the resistance value becomes equal to the resistance value of objective precision exists, so that a resistor having objective precision can be surely manufactured after all.</p> |
