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发明名称
FORMATION OF POLYIMIDE RESIN FILM PATTERN
摘要
申请公布号
JPH06310495(A)
申请公布日期
1994.11.04
申请号
JP19930100865
申请日期
1993.04.27
申请人
HITACHI CHEM CO LTD
发明人
SEKINE HIROYOSHI
分类号
H01L21/306;H01L21/312;(IPC1-7):H01L21/312
主分类号
H01L21/306
代理机构
代理人
主权项
地址
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