| 摘要 |
PURPOSE:To obtain a resist pattern having high sensitivity and excellent in resolving power, developability and heat resistance by incorporating an alkali- soluble resin, a quinonediazido compd. and a compd. represented by a specified structural formula. CONSTITUTION:This positive type photoresist compsn. contains an alkalisoluble resin, a quinonediazido compd. and a compd. represented by the formula, wherein X is-0-,-S-,-SO-,-SO2-, etc., each of R1-R4 is H, halogen, alkyl, aryl, aralkyl, etc., R5 is H, halogen, alkyl, aryl, aralkyl, alkoxy, etc., each of (a), (b) and (d) is 0 or an integer of 1-5, at least one of (a), (b) and (d) is not 0, each of (c) and (g) is 0 or an integer of 1-4 and each of (e), (f) and (h) is 0 or an integer of 1-5. |
