| 摘要 |
<p>PURPOSE:To shorten a lead time, save on the space of a clean room and improve a yield, and further, to make the extensions of processes easy. CONSTITUTION:A semiconductor manufacturing line is so constructed that the extensions and replacements of lithographic processes A1-A7 and thin film processes B1-B8 are performed to a carriage path 1. A plurality of semiconductor wafers are stored in a cassette 3, and through the carriage path 1 the wafers are carried from one of the lithographic processes A1-A7 and the thin film processes B1-B8 to another of them. In the lithographic processes A1-A7, such processings of respective processes associated with a lithography as a resist coating, an exposure processing and a development are performed. In the thin film processes, such processings of respective processes associated with the formation of a thin film as an etching processing, a resist peeling, an inspection, a cleaning, the formation of a thin film and another inspection are performed. Further, the equipment management and the production management, etc., of the manufacturing equipments for manufacturing thin film transistors to be manufactured through this semiconductor manufacturing line are performed in a control room 4.</p> |
