| 摘要 |
<p>A method of correcting a missing defect of a patterned film formed on an article is carried out by steps of providing an operative vacuum chamber having a pin hole, positioning an area of the missing defect outside the vacuum chamber in registration with the pin hole, operating the vacuum chamber to cause therein cold cathode discharging to generate particles, and directing a stream of the particles through the pin hole onto the area of the missing defect to deposit thereon a corrective film of the particles. A method of correcting a remaining defect of a patterned film formed on an article is carried out by steps of providing an operative vacuum chamber having a pin hole, positioning an area of the remaining defect outside the vacuum chamber in registration with the pin hole, operating the vacuum chamber to cause therein cold cathode discharging to generate particles and gas ions, and directing a stream of the particles and gas ions through the pin hole onto the area of the remaining defect to thereby remove therefrom a left patterned film to correct the remaining defect.</p> |
